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研究了不同的沉积电压对辅助加热式PCVD -TiN涂层的影响。实验证明 ,提高沉积电压可以细化TiN涂层的柱状晶结构 ,增加TiN涂层的显微硬度和沉积速率。在试验范围内 ,涂层内残存的氯含量基本不受沉积电压的影响
The effect of different deposition voltages on the PCVD-TiN coating was investigated. Experiments show that increasing the deposition voltage can refine the columnar crystal structure of the TiN coating and increase the microhardness and deposition rate of the TiN coating. Within the experimental range, the residual chlorine content in the coating is not substantially affected by the deposition voltage