本文讨论了制造Spindt型聚焦场发射阵列FFEA过程中需要的对准技术 ,提出了具有自对准能力的刻蚀方法 ,满足了聚焦型发射阵列的聚焦极与门极的精确对准 .比较了传统方法与新方法的不同 ,具体论述了整个工艺过程 ,并对制备出的器件进行了SEM观测 ,结果达到了预想的目标 . In this paper, we discuss the alignment technique required to fabricate a Find-type field-emission array (FFEA) for Spindt-type and propose an etching method with self-aligning capability to meet the precise alignment of the focus and gate of the focusing emitter array. The difference between the traditional method and the new method specifically discusses the whole process, and SEM observation of the prepared device has achieved the expected goal.