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沉积速率是电子束蒸发制备光学薄膜的重要工艺参数之一,影响着成膜的微观结构和化学成分,从而对薄膜的光学性质和机械性质都产生很大的影响。SiO2材料是制备光学薄膜的主要低折射率材料之一,由于其导热性很弱,并且以升华的方式进行蒸发,因此在蒸发过程中表面会出现凹坑,影响其蒸发特性,不利于沉积速率的稳定。考虑到SiO2材料的蒸发特性,进行了电子束自动蒸发SiO2材料沉积速率控制实验,利用设计的扫描控制仪,采用设计的路径进行焦斑自动扫描,在扫描过程中采用比例-积分-微分(PID)闭环反馈法对沉积速率进行控制,实验结果表明,通过控制可以得到良好的材料表面特性和较稳定的沉积速率。
The deposition rate is one of the important process parameters for the preparation of optical thin films by electron beam evaporation, which affects the microstructure and chemical composition of the films and thus greatly affects the optical and mechanical properties of the films. SiO2 material is one of the main low refractive index materials for preparing optical thin films. Due to its low thermal conductivity and evaporation in a sublimation manner, SiO2 pits will appear on the surface during evaporation, affecting the evaporation characteristics and the deposition rate Stable. Taking into account the evaporation characteristics of SiO2 material, the deposition rate control experiment of SiO2 material was carried out by electron beam automatic evaporation. The designed scanning controller was used to automatically scan the focal spot with the designed path. During the scanning process, the proportional-integral-derivative ) Closed-loop feedback method to control the deposition rate, the experimental results show that by controlling the material surface characteristics can be good and more stable deposition rate.