An all solid-state pulsed power generator for plasma immersion ion implantation(PIII)is described.The pulsed power system is based on a Marx circuit configuration and semi-conductor switches,which have many advantages in adjustable repetition frequency,pulse widthmodulation and long serving life compared with the conventional circuit category,tube-basedtechnologies such as gridded vacuum tubes,thyratrons,pulse forming networks and transformers.The operation of PIII with pulse repetition frequencies up to 500 Hz has been achieved at a pulsevoltage amplitude from 2 kV to 60 kV,with an adjustable pulse duration from 1 μs to 100 μs.The proposed system and its performance,as used to drive a plasma ion implantation chamber,are described in detail on the basis of the experimental results. An all solid-state pulsed power generator for plasma immersion ion implantation (PIII) is described. Pulsed power system is based on a Marx circuit configuration and semi-conductor switches, which have many advantages in adjustable repetition frequency, pulse width modulation and long serving life compared with the conventional circuit category, tube-based technology such as gridded vacuum tubes, thyratrons, pulse forming networks and transformers. The operation of PIII with pulse repetition frequencies up to 500 Hz has been achieved at a pulsevoltage amplitude from 2 kV to 60 kV , with an adjustable pulse duration from 1 μs to 100 μs. The proposed system and its performance, as used to drive a plasma ion implantation chamber, are described in detail on the basis of the experimental results.