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在TC4钛合金表面制备了Ni-P低磷化学镀层,研究了镀液中NiSO4.6H2O浓度对镀层沉积速度及镀层硬度的影响。采用紫外可见光分光光度计、扫描电镜及能谱仪、显微硬度仪分别对镀液中的NiSO4.6H2O浓度,镀层的表面形貌和化学成分,镀层的硬度进行测定。结果表明:化学镀液最佳施镀周期为60min。镀液中NiSO4.6H2O浓度对化学反应速率有重要影响,当浓度差达到临界值4.77g/L,沉积速度显著降低。随着反应进行,晶胞尺寸逐渐增大,晶粒粗化;同时镀层磷含量逐渐升高,镀层结构由晶态向微晶态转化,塑性变形抗力降低,硬度降低。
Ni-P low-phosphorus electroless plating was prepared on the surface of TC4 titanium alloy, and the effect of NiSO4.6H2O concentration in the plating solution on the deposition rate and hardness of the coating was studied. The concentration of NiSO4.6H2O in the bath, the surface topography, the chemical composition and the hardness of the coating were measured by UV-Vis spectrophotometer, scanning electron microscopy and energy dispersive spectrometer, respectively. The results show that the optimal plating period is 60min. The concentration of NiSO4.6H2O in the bath has an important effect on the chemical reaction rate. When the concentration difference reaches the critical value of 4.77g / L, the deposition rate is significantly reduced. As the reaction proceeds, the size of the unit cell increases and the grains coarsen. At the same time, the content of phosphorus in the layer increases gradually. The structure of the layer changes from the crystalline state to the microcrystalline state. The plastic deformation resistance decreases and the hardness decreases.