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从金刚石薄膜半导体器件的实用要求出发,比较了金刚石薄膜的各种图形化技术,研究了它们各自的特点和适用性,如播种法选择性生长、掩膜法选择性生长、离子束刻蚀和反应离子刻蚀技术等。
Based on the practical requirements of diamond thin film semiconductor devices, various patterns of diamond films were compared and their characteristics and applicability were studied, such as selective growth of seeding method, selective growth of mask method, ion beam etching and Reactive ion etching technology.