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采用渗氮与多弧离子镀复合技术,在不同靶电流条件下制备Ti0.33Al0.67N膜层,分析靶电流对膜层形貌、膜层厚度、结合力及显微硬度等性能的影响。得出靶电流设计范围内存在一个最佳值,以获得膜层最优性能。
The Ti0.33Al0.67N film was prepared under different target current conditions by nitriding and multi-arc ion plating. The effects of target current on film morphology, film thickness, cohesion and microhardness were analyzed. It is concluded that there is an optimal value in the design range of the target current in order to obtain the optimum performance of the film.