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沿纳米多层膜生长方向切割可制成周期只有几纳米而厚度几十微米的切片多层膜光栅.基于该切片多层膜光栅塔尔博特自成像效应的X射线光刻是一种新型的纳米图样制作方法.已有学者用该方法完成了百纳米结构光栅的制作.采用严格耦合波方法,本文模拟计算了切片多层膜光栅在满足塔尔博特自成像条件下的后表面光场分布,详细讨论三个影响光栅后表面成像质量的重要参数:光栅厚度、材料厚度所占比例和多层膜周期.模拟结果表明,光栅厚度不仅影响X射线透射率,还会改变像面条纹衬比度.材料厚度比的大小直接决定像面是否存在清晰条纹,选取合适的材料厚度比,得到了前人实验中近场反常成像现象.计算还表明,在一定条件下,采用周期更小的多层膜光栅有望获得更高分辨率的纳米图形,这说明使用塔尔博特效应制作更加精细的纳米结构图形具有可行性.
Cutting along the growth direction of the nanometer multi-layer film can make a slice multi-layer grating with a period of only a few nanometers and a thickness of several tens of micrometers.X-ray lithography based on the self-imaging effect of the multi-layered film grating Talbot is a new type Of the nano-patterning methods have been used in this method has been completed 100-nanometer grating structure produced by using a rigorous coupled wave method, this paper simulated the slice multilayer grating to meet the Talbot self-imaging conditions, the back surface of the light field Distribution, the three important parameters influencing the imaging quality of the grating surface are discussed in detail: grating thickness, proportion of material thickness and multilayer film period.The simulation results show that the grating thickness not only affects the X-ray transmittance, but also changes the image surface stripe lining Than the degree of material thickness ratio directly determines the size of the image clear stripes exist, select the appropriate material thickness ratio, the phenomenon of near-field anomalies obtained in previous experiments anomaly calculation also shows that under certain conditions, the use of smaller cycles Multi-layer grating is expected to obtain higher resolution of the nano-pattern, indicating that the use of Talbot effect to create more refined nano-structure graphics is feasible.