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本文简要地回顾了腐蚀V形槽的几种方法。并以联氨(N_2H_4)腐蚀V形槽工艺为主,结合半导体硅的结构报告了腐蚀方法,及达到最佳化的条件。并指出了此工艺的应用。
This article briefly reviews several ways to etch V-grooves. And the hydrazine (N_2H_4) etching V-groove process mainly combined with the structure of semiconductor silicon reported corrosion method, and to achieve the optimum conditions. And pointed out the application of this technology.