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研究一种控制多层介质膜上的光刻胶光栅掩模占宽比(线宽与周期之比)的新方法。该方法基于下面的原理:如果某泄漏模在包层中的隐失尾较强,那么它的等效折射率受光刻胶光栅占宽比变化的影响就大,从而可以利用耦合角度来实时控制光栅占宽比。在光栅制作的显影阶段,采用实时监测技术,根据耦合角度和占宽比之间的关系预设入射光角度,在出现共振反常的时刻停止显影来控制占宽比。实验结果表明,固定适当的入射角度可以得到特定的占宽比;改变入射角度,占宽比按照预计的规律变化,因此定性地验证了这种占宽比控制方法的可行性。文中给出了监控装置和具体的实验方法,并讨论了误差来源和影响。
A new method for controlling the mask aspect ratio (the ratio of line width to period) of a photoresist grating mask on a multilayer dielectric film is investigated. The method is based on the following principle: if a leaky mode has a strong invisible tail in the cladding, its equivalent refractive index will be greatly affected by the change in the aspect ratio of the photoresist grating, so that the coupling angle can be used to perform real-time Control grating ratio. In the developing stage of grating production, the real-time monitoring technology is used to preset the angle of incident light according to the relationship between the coupling angle and the occupancy ratio, and stop the development when the resonance abnormality occurs to control the occupancy ratio. The experimental results show that the fixed aspect ratio can obtain a certain aspect ratio, and the angle of incidence and the aspect ratio change according to the expected rule. Therefore, the feasibility of this method is verified qualitatively. The article gives the monitoring device and the specific experimental methods, and discusses the source of error and impact.