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在PDP技术中,MgO的关键作用已经被认识。二次电子的高释放能力,低溅射率和高电阻率使得这个材料适用于PDP中。然而,在PDP的生产过程中,MgO层将要经受几次在苛刻环境条件下的高温循环。在这个过程中,由于水气和二氧化碳的出现,进入MgO而形成污染,这种污染行为已广泛被报道。镁的氢氧化物和镁的碳氧化物都很容易飞溅,会减少平板的寿命,增加放电电压,影响功率消耗;降低透明度,更促使显示效果退化。解决MgO杂质的方法是基于应用一些除气作用能比在氧化层上杂物的吸附作用的速度更快的消气剂材料,并提出一个结构适当的吸附消气系统,从开始到整个工作寿命期里进行良好不变的吸附。最后,确定一个在减小MgO杂质的吸附结构的效果的模型。
In the PDP technology, the key role of MgO has been recognized. The high release of secondary electrons, low sputtering and high resistivity make this material suitable for use in PDPs. However, in the production of PDPs, the MgO layer will be subjected to several high temperature cycles under harsh environmental conditions. In this process, pollution has been reported due to the presence of moisture and carbon dioxide into MgO, a practice that has been widely reported. Magnesium hydroxide and magnesium oxide are very easy to splash, will reduce the life of the plate, increase the discharge voltage, affecting power consumption; reduce transparency, but also to promote the display of degradation. The solution to MgO impurities is based on the use of getter materials that have a faster outgassing rate than the sorption of debris on the oxide layer and propose a properly structured getter absorption system that extends from the beginning to the entire working life Good and constant adsorption. Finally, a model of the effect of reducing the adsorption structure of MgO impurities is determined.