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提出使用数字CCD拍摄光干涉条纹,使用图像处理软件进行灰度值扫描分析光干涉条纹的方法,对不透明薄膜进行光干涉法测厚。数字CCD和图像处理软件的结合使用能够最大限度的降低目测带来的误差,并且也避免了使用复杂的干涉条纹提取算法,可以方便、准确地对不透明薄膜进行光干涉法测厚。同时我们使用光干涉法和轮廓仪法对不同高度遮挡物形成的台阶进行了对比测量,分析了不同台阶边缘斜坡对于光干涉法测量结果的影响,指出在制备台阶时遮挡物的高度必须满足一定的条件,并且根据这个条件推导出在我们的磁控溅射设备中,遮挡物高度小于50μm可以得到满足光干涉法测厚条件的台阶。
Proposed the use of digital CCD filming light interference fringes, the use of image processing software gray value scanning analysis of optical interference fringes, the opaque film by optical interferometry thickness. The combined use of digital CCD and image processing software minimizes visual error and avoids the need for complex interference fringe extraction algorithms for light interferometric thickness measurement of opaque films with ease and accuracy. At the same time, we used optical interferometry and profilometry to measure the steps formed by obstructions of different heights, and analyzed the influence of different step edge slopes on the results of optical interferometry. It is pointed out that the height of the obstructions must meet a certain level According to this condition, we can deduce that in our magnetron sputtering equipment, the height of the obstructions less than 50μm can be used to meet the requirements of optical interferometric thickness measurement.