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本文报道了采用金属有机化合物气相沉积方法生长 Fe_2O_3薄膜。使 Fe(C_5H_5)_2在氧气气氛中进行气相热分解氧化反应,在热硅基片上沉积生长 Fe_2O_3薄膜(<1000(?))。通过X射线衍射和电子衍射对薄膜进行了鉴定,测定了薄膜的红外吸收光谱。
This paper reports the growth of Fe_2O_3 thin films by vapor deposition of metal organic compounds. Fe (C_5H_5) _2 was subjected to gas phase thermal decomposition and oxidation reaction in an oxygen atmosphere, and Fe_2O_3 thin film (<1000 ()) was deposited and deposited on a hot silicon substrate. The films were characterized by X-ray diffraction and electron diffraction. The infrared absorption spectra of the films were measured.