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(一)概述 现代光学薄膜技术,要求对影响膜层质量的各种工艺参数进行严格控制,如薄膜厚度,电子扫描蒸发源,蒸发速率,真空压强,基片温度以及高压自动灭弧等,通过对这些参数的自动控制,实现镀膜工艺参数良好的再现性,从而达到提高镀膜质量和确保在批量生产中膜层质量的一致性,同时也是研制和生产新膜系不可缺少的条件。真空自动压强控制仪是我所研制的新产品,该仪器是为解决在实际生产过程中遇到的压强调整
(A) Overview Modern optical film technology requires strict control of the various process parameters that affect the quality of the film, such as film thickness, electron scanning evaporation source, evaporation rate, vacuum pressure, substrate temperature and high voltage automatic arc extinguishing, Automatic control of these parameters to achieve good reproducibility of the coating process parameters, so as to achieve the coating quality and to ensure consistency in mass production of the film quality, but also the development and production of new film is an indispensable condition. Vacuum automatic pressure controller is developed by my new product, the instrument is to solve the pressure in the actual production process to adjust