【摘 要】
：
The kinetics equation of deposition rate was implemented to help explain some of the mechanisms responsible for structures observed during the deposition of CoF
【机 构】
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Department of Electronic Science and Technology, Huazhong University of Science and Technology, Wnha
【出 处】
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武汉理工大学学报（材料科学版）（英文版）
论文部分内容阅读
The kinetics equation of deposition rate was implemented to help explain some of the mechanisms responsible for structures observed during the deposition of CoFeB films on poly-ester plastic.The plating rate of electroless CoFeB films is a function of concentration of sodium tetrahydroborate, pH of the plating bath, plating temperature and the metallic ratio. The estimated regression coefficient, confidence interval, residual error and confidence interval were confirmed by computer program. The optimal composition of the plating bath was obtained and the dynamic electromagnetic parameters of films were measured in the 2-10 GHz range. At 2 GHz, the permeability, magnetic loss of the electroless CoFeB films were 304,76.6 respectively as the concentration of reducer is 1 g·L-1.
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