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利用软x射线磁性圆二色吸收谱(XMCD)研究了Si衬底上沉积的不同厚度的Co膜的轨道磁矩和自旋磁矩.样品是磁控溅射方法制备的,膜的厚度分别是2nm,10nm和30nm,并在表面覆盖0.8—1nm厚的金膜防止样品的氧化.根据XMCD求和定则计算得到的轨道磁矩和自旋磁矩分别是0.249—0.195μB(玻尔磁子)和1.230—1.734μB.随着膜厚的减小,Co原子的轨道磁矩增加,而自旋磁矩下降.轨道磁矩与总磁矩的比值由0.101上升至0.168,即2nm膜中Co原子的轨道磁矩对总磁矩的贡献比30nm膜中Co原子的大了83%.
The orbital and spin magnetic moments of different thicknesses of Co films deposited on Si substrates were investigated by soft X-ray magnetic circular dichroism (XMCD) spectroscopy. The samples were prepared by magnetron sputtering and the thickness of the films was Is 2nm, 10nm and 30nm, and the surface covered with a 0.8-1nm thick gold film to prevent the oxidation of the sample.According to XMCD summation rule calculated orbital and spin magnetic moment are 0.249-0.195μB (Bohr magnetic ) And 1.230-1.734μB. As the film thickness decreases, the orbital magnetic moment of Co atom increases while the spin magnetic moment decreases.The ratio of orbital magnetic moment to total magnetic moment increases from 0.101 to 0.168, that is, in 2nm film The orbital magnetic moment of the Co atom contributes 83% of the total magnetic moment more than the Co atom in the 30 nm film.