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在真空度10－2Pa以上的条件下对溅射FeSiAl膜进行了两小时真空退火热处理。发现样品的相结构并未因此而改变，但热处理过程中的晶粒长大和应力消除明显改善了溅射膜的软磁性能。另外，退火FeSiAl膜的有效磁导率μeff直到10．5MHz都没有出现下降趋势，表现出优良的高频性能。
The sputtered FeSiAl film was subjected to a vacuum annealing heat treatment for two hours under a vacuum of 10-2 Pa or more. It was found that the phase structure of the sample did not change. However, the grain growth and stress relief in the heat treatment significantly improved the soft magnetic properties of the sputtered film. In addition, the effective magnetic permeability μeff annealed FeSiAl film up to 10.5MHz did not show a downward trend, showing excellent high-frequency performance.