纳米金属氧化物制备多晶Cu(In,Ga)Se2薄膜反应过程及其性能研究

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以铜铟镓纳米金属氧化物为起始原料,采用化学还原+固体硒源后硒化的方法在不锈钢表面制备出多晶Cu(In,Ga)Se2(CIGS)薄膜。采用场发射扫描电镜、高分辨透射电镜、能谱分析和X射线衍射等方法对制备过程中材料组成和结构的演变进行了研究,采用霍尔效应测试仪和吸收光谱分析等对多晶CIGS薄膜的性能进行了表征。研究结果表明,纳米金属氧化物主要含CuO、In2O3、Ga2O3和铜-铟、铜-镓二元合金氧化物等成分,在还原反应中逐渐转变成Cu11In9、Cu9In4等产物,同时薄膜中形成大量孔隙;硒化过程中,硒蒸气
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