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针对3 k W半导体激光器应用于机器人表面改性系统,聚焦光斑不均匀问题,提出了一种采用菲涅耳透镜对面阵高功率半导体激光器输出光斑进行聚焦匀化的方法,设计出尺寸为10 mm×2 mm的均匀矩形光斑。利用Zemax和Matlab软件进行仿真分析,研究了菲涅耳透镜楞距和入射光发散角对聚焦系统焦斑均匀性的影响。结果表明,当菲涅耳透镜楞距在1 mm以内时,焦斑均匀性最佳约为94.90%。随着楞距的继续增大,输出光斑均匀性会逐渐降低。当楞距增大到2.5 mm后,光斑的均匀性不再随楞距的增大而变化,基本稳定在93.85%左右。焦斑的均匀性会随着发散角的增大有所提高,但是发散角太大会使聚焦难度增加,而且光斑均匀性也随之劣化。当菲涅耳透镜楞距为1 mm,入射光发散角在12.5~20 mrad范围内时,焦斑均匀性最好约为95.22%。
Aiming at the problem of 3 W W laser system applied to the robot surface modification system and focused spot unevenness, a method of focusing and homogenizing the output laser spot of the area array high power semiconductor laser using Fresnel lens was proposed. × 2 mm uniform rectangular spot. The effects of the Fresnel lens fluff angle and incident light divergence angle on the focal spot uniformity of the focusing system were studied by using the software Zemax and Matlab. The results show that when the Fresnel lens spacing is less than 1 mm, the best uniformity of focal spot is about 94.90%. As the gap continues to increase, the uniformity of the output light will be gradually reduced. When the flute width increases to 2.5 mm, the spot uniformity no longer changes with the increase of the flute pitch, and it is basically stable at about 93.85%. The uniformity of the focal spot increases as the divergence angle increases, but the divergence angle increases the focusing difficulty and the spot uniformity deteriorates. When the Fresnel lens pitch is 1 mm and the incident light divergence angle is in the range of 12.5-20 mrad, the uniformity of the focal spot is preferably about 95.22%.