【摘 要】
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A new kind of SiOx filmon Al substrate,prepared by Ambient Pressure Chemical Vapor Deposition (APCVD) is reported in this paper. It is proposed that the SiOx pa
【机 构】
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Material Science and Engineering Department,School of Electrical & Electronic Engineering
论文部分内容阅读
A new kind of SiOx filmon Al substrate,prepared by Ambient Pressure Chemical Vapor Deposition (APCVD) is reported in this paper. It is proposed that the SiOx particles as products of SiH4 and O2 reaction deposited on the heated Al surface, followed by close packing and further growth to form the thin film. The morphology, composition and microstructure of the film are characterized by SEM, XPS, XRD and HRTEM. The results show that the SiOx film comprises a majority of uncrystalline structure with a fraction of dispersed ordered zones and the atomic ratio of Si/O in the film is 1:1.60～1:1.75. The tests show that the film is well-bonded with the substrate.
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