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本文利用最小自由能法计算了Ｈ２－ＮＦ３体系和Ｃ２Ｈ４－ＮＦ３体系的ＤＦ化学激光器燃烧室中的化学平衡组分，获得了不同体系ＤＦ化学激光器氧化剂与燃料的最佳配比，着重研究了燃料、稀释剂以及燃烧室压力对燃烧后产物中Ｆ原子浓度的影响。计算结果表明：Ｃ２Ｈ４－ＮＦ３体系燃烧产物中Ｆ原子的浓度要比Ｈ２－ＮＦ３体系高，无论是Ｈ２－ＮＦ３体系还是Ｃ２Ｈ４－ＮＦ３体系，当反应物中稀释剂的浓度较高时，燃烧产物中Ｆ原子的浓度随燃料和氧化剂比值的变化较缓慢，而当反应物中稀释剂的浓度比较低时，燃烧产物中Ｆ原子浓度对于燃料和氧化剂比值的变化就比较敏感。并将有关的计算结果与实验数据进行了比较。
In this paper, the chemical equilibrium components in the DF chemical laser combustor of H2-NF3 system and C2H4-NF3 system were calculated by the minimum free energy method, and the optimal ratio of DF chemical laser oxidizer and fuel was obtained. The effects of fuel , Diluent and pressure in the combustion chamber on the concentration of F atoms in the product after combustion. The calculated results show that the concentration of F atoms in the combustion products of C2H4-NF3 system is higher than that of H2-NF3 system. Whether H2-NF3 system or C2H4-NF3 system, when the concentration of diluent in the reactants is high, The concentration of F atoms varies slowly with the ratio of fuel to oxidant, whereas when the concentration of diluent in the reactants is relatively low, the concentration of F atoms in the combustion products is more sensitive to the ratio of fuel to oxidant. The related calculation results are compared with the experimental data.