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NEC日前宣称为了解决由于采用最先进大规模集成电路（LSI）器件微细化产生的细线效果，造成铜配线阻抗急增的技术难题，开发出可抑制造成其主要原因的配线中界面电子散乱问题，实现铜配线低阻抗化的配线材料技术。
NEC开发出实现微细铜配线低阻抗化的配线材料技术
【摘 要】
：
NEC日前宣称为了解决由于采用最先进大规模集成电路（LSI）器件微细化产生的细线效果，造成铜配线阻抗急增的技术难题，开发出可抑制造成其主要原因的配线中界面电子散乱问题，实现铜配
【出 处】
：
集成电路应用
【发表日期】
：
2007年7期
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