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近年来,光加热在电子领域中的应用日趋广泛并显示出很大的优越性.本文主要介绍一下光加热的特点,光加热在半导体工艺中的应用情况.例如光加热拉制单晶、光加热外延、光加热制备太阳能电池等.光加热在新工艺SOI技术中的应用情况,尤其是离子注入后的重要工艺退火中使用光加热的效果特别显著.并对有关的光加热设备作了简要介绍.
In recent years, the application of light heating in the field of electronics is becoming more and more extensive and shows great superiority.This paper mainly introduces the characteristics of light heating, the application of light heating in semiconductor technology, such as light-heating single crystal, light Heating epitaxy, solar cell heating, etc. The application of light heating in SOI technology of new process, especially the important process annealing after ion implantation, is particularly significant, and the relevant light heating equipment is briefly introduced Introduction.