新的微细加工技术美国国家标准技术研究所和哈佛大学正在研究一种新的微细刻蚀方法，即用粒子束代替光束．目前，用光刻的方法剜蚀集成电路可达０３５ｐｍ的尺寸．在１０年内，光刻尺寸将达到０１３ｐｍ的极限．使用新的加工方法可＄Ｊ蚀出具有几十纳米尺寸的图形．光刻尺... New Microfabrication Technology The National Institute of Standards and Technology and Harvard University are working on a new method of microfabrication that uses particle beams instead of beams. Currently, lithography is used to etch integrated circuits up to 035 pm in size. Within 10 years, lithography size will reach the limit of 013pm. Using the new processing method, it is possible to etch a pattern of tens of nanometers in size. Photolithography ...