【摘 要】
：
提出了一种SiC反型层表面粗糙散射的指数模型 ,并对 6H SiC反型层迁移率进行了单电子的MonteCarlo模拟 ,模拟中考虑了沟道区的量子化效应 .模拟结果表明 ,采用表面粗糙散射的
【机 构】
：
西安电子科技大学微电子研究所!西安710071,西安电子科技大学微电子研究所!西安710071,西安电子科技大学微电子研究所!西安710071
论文部分内容阅读
提出了一种SiC反型层表面粗糙散射的指数模型 ,并对 6H SiC反型层迁移率进行了单电子的MonteCarlo模拟 ,模拟中考虑了沟道区的量子化效应 .模拟结果表明 ,采用表面粗糙散射的指数模型能够使SiC反型层迁移率的模拟结果和实验值符合得更好 .模拟结果还反映出有效横向电场较高时表面粗糙散射的作用会变得更显著 ,电子的屏蔽效应降低了粗糙散射对沟道迁移率的影响 ,温度升高会引起沟道迁移率降低 .
An exponential model of surface rough scattering of SiC inversion layer was proposed and the single-electron Monte Carlo simulation of 6H SiC inversion layer mobility was taken into account. The quantization of channel region was taken into account in the simulation. The simulation results show that, The rough scattering index model can make the simulation results of the inversion layer migration rate of SiC match the experimental ones well.The simulation results also show that the effect of surface roughness scattering becomes more significant when the effective transverse electric field is higher and the shielding effect of electrons The influence of the rough scattering on the channel mobility is reduced, and the increase of the temperature causes the channel mobility to decrease.
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