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为了探寻准分子激光电化学刻蚀工艺的特性,采用功率密度大的248nm准分子激光聚焦照射浸在溶液中的金属表面,实现了一种激光电化学刻蚀复合工艺。在实验的基础上,通过对激光电化学刻蚀金属和硅的基本形貌进行比较和分析,研究了该工艺的工艺特性。研究结果表明,该复合工艺为激光直接刻蚀和激光热诱导电化学刻蚀。其中激光热诱导电化学刻蚀是通过激光的光热效应和由激光诱导的冲击波来实现对腐蚀液和材料的冲击、微搅拌等作用的。
In order to explore the characteristics of the excimer laser electrochemical etching process, a 248nm excimer laser with a high power density was used to focus and irradiate the metal surface immersed in the solution to achieve a laser electrochemical etching composite process. On the basis of experiments, the basic characteristics of laser electrochemically etched metal and silicon are compared and analyzed, and the process characteristics of the process are studied. The results show that the composite process is laser direct etching and laser thermal induced electrochemical etching. Among them, the laser thermal-induced electrochemical etching is realized by the photothermal effect of the laser and the shock wave induced by the laser to effect the impact of the etching solution and the material, the micro-stirring and the like.