在普通离子氮化过程中,零件小孔、窄槽的内部常常会产生氮化不上、辉光集中和弧光放电三个问题。国内外一些离子氮化工作者把这些问题错误地认为是由辉光放电特点所决定的。因而限制了小孔、窄槽离子氮化的实际应用。针对这种情况,本文探讨了在离子氮化时于狭小部位造成上述三个问题的根本原因。在查明问题完全是外部因素的影响后,提出了有效的解决办法,并推荐出一种专门进行小孔、窄槽离子氮化的工艺操作。 In ordinary ion nitriding process, parts of the hole, the narrow slot often have nitriding, glow and arc discharge within the three issues. Some domestic and foreign ion nitriding workers mistakenly believe these problems are determined by the characteristics of glow discharge. Thus limiting the practical application of small holes, narrow slot ion nitriding. In response to this situation, this article explores the root cause of the above three problems in the narrow area during ion nitriding. After ascertaining that the problem is completely influenced by external factors, an effective solution is put forward and a special process for nitridation of small holes and narrow slots is recommended.