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采用热丝化学气相沉积技术制备微晶硅薄膜,利用X射线衍射谱、Raman散射谱、透射光谱和扫描电子显微镜等检测手段,系统地研究沉积过程中沉积气压对微晶硅薄膜晶粒尺寸、晶态比和光学带隙的影响,运用Tacu法则对薄膜的透射率和厚度进行计算分析,得到薄膜光学带隙与沉积气压之间的关系,结果表明薄膜的光学带隙随着沉积气压的升高而单调下降。
The microcrystalline silicon thin films were prepared by hot wire chemical vapor deposition. The deposition pressure on the microcrystalline silicon thin films was studied systematically by means of X-ray diffraction, Raman scattering, transmission spectra and scanning electron microscopy. Crystal ratio and optical bandgap, the relationship between the optical band gap of the film and the deposition pressure is obtained by calculating and analyzing the transmittance and the thickness of the film by using the Tacu’s rule. The results show that the optical band gap of the film increases with the deposition pressure High and monotonous decline.