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利用光学显微镜、X射线衍射(XRD)和扫描电子显微镜的电子背散射衍射花样(electronic backscatter ring diffraction,EBSD),对用化学气相沉积制备的高纯钨进行了微观结构和晶面取向分析;利用霍普金森压杆系统和电子万能试验机测试了高纯钨的动态和准静态力学性能。研究表明:化学气相沉积高纯钨具有柱状晶组织,并且具有明显的(100)择优取向;动态屈服强度达到2000MPa以上,静态屈服强度约为1350MPa,具有应变速率敏感性。
The microstructure and crystallographic orientation of high purity tungsten prepared by chemical vapor deposition were analyzed by using optical backscatter ring diffraction (EBSD) with optical microscope, X-ray diffraction (XRD) and scanning electron microscopy Hopkinson pressure bar system and electronic universal testing machine tested dynamic and quasi-static mechanical properties of high-purity tungsten. The results show that chemical vapor deposition of high purity tungsten has a columnar grain structure with obvious (100) preferred orientation, dynamic yield strength of more than 2000MPa and static yield strength of about 1350MPa, which is sensitive to strain rate.