The Influence of Annealing Temperature on the Structure and Properties of TiO2 Films Prepared by Spu

来源 :武汉理工大学学报(材料科学版)英 | 被引量 : 0次 | 上传用户:lvsby2009
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The TiO2 films were prepared on slides by dc reactive magnetron sputtering, then the samples were annealed at 300 ℃,350 ℃,400 ℃,450 ℃,500 ℃ and 550 ℃,respectively. X-ray diffraction (XRD) was used to obtain the TiO2 film crystalline structure; X-ray photoelectron spectroscopy (XPS) was used to study the film surface stoichiometries; surface morphologies were studied by scanning electron microscopy (SEM); the contact angle was tested to indicate the TiO2 film wettability; and the photocatalytic activity testing was conducted to evaluate the photocatalysis properties. The photocatalytic activity and contact angle testing results were correlated with the crystallinity, surface morphologies and surface *OH concentration of TiO2 films. The samples with a higher polycrystalline anatase structure, rough surface and high *OH concentration displayed a better photoinduced hydrophilicity and a stronger photocatalysis.
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