论文部分内容阅读
编辑同志: 在《微电子学与计算机》1976年第4期的<读者园地>里,“关于‘外延自隔离’现象”一文的最后部分写道:“我们还有一个体会,在经典的P-N结隔离方法中,有时也出现‘自隔离’现象(包括沟道比较大的情况),凡出现这种现象的片,按经典工艺流下去,一般管子特性与成品率都不理想。”我们生产中,有时也碰到那种“沟道比较大的情况”。为了得到好的管子特性和好的成品率,我们很想知道那种挽救此类片子的非经典工艺,希望该文作者能给于帮助。关于“沟道比较大的情况”,我们还有这样的体会,即经高温处理后会变好,这可能是金的关系。基本再分布后,岛间隔离特性正常,无沟道;如果在700℃下退火,
Editorial Comrades: In the last section of the article “The Phenomena of ’Denial-of-Self-isolation’ ’in The Reader’s Corner, Microelectronics and Computers, Volume 4, 1976, read:” We also had one realization that in the classic PN In the junction isolation method, there are sometimes “self-isolation” phenomenon (including the channel is relatively large), where this phenomenon of the film, according to the classic flow down, the general tube properties and yield are not satisfactory. “We produce In some cases also encountered that kind of ”channel situation is relatively large.“ In order to get good tube characteristics and good yield, we would like to know the kind of non-classical process to save such films, I hope the authors can give help. With regard to ”the situation with relatively large channels", we also have the experience that after high-temperature treatment will improve, this may be the golden relationship. After the basic redistribution, the island isolation characteristics of normal, non-channel; if annealed at 700 ℃,