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明导国际(Mentor Graphics)认为,其最新的DFM(可制造性设计,design- for-manufacturing)将对集成电路设计人员设计“光刻友好”的集成电路布局提供帮助。该公司的新型Calibre LFD(光刻友好设计。li- thography-friendly design)是一种类似于DRC/LVS(设计规则检查/低压信令,design- rule-checking/low-voltage-signaling)的工具。不过,Calibre LFD并不检查布局是否符合设计规则(例如线迹宽度和间距)与早期原理图,而是检查布局是否符合描述给定生产线剂量和焦点的光刻制造规则。该工具集成了与OPCVerify一样的引擎,它采用的是一种类似OPC(光学接近修正,optical-proximity- correction)的技术,是Mentor在1月份为光刻设计人员推出的。
Mentor Graphics believes its latest DFM (design-for-manufacturing) will help integrated circuit designers design “litho-friendly” IC layouts. The company’s new Caliber LFD (lithography-friendly design) is a tool similar to DRC / LVS (design-rule-checking / low-voltage-signaling) . However, the Caliber LFD does not check that the layout conforms to design rules such as stitch width and spacing and early schematics, but checks if the layout meets the lithography manufacturing rules that describe the dose and focus for a given line. The tool integrates with the same OPCVerify engine, which uses a similar OPC (optical proximity correction, optical-proximity-correction) technology, is Mentor lithography designers in January launched.