论文部分内容阅读
基于抛光所引起的熔石英元件表面、亚表面所存在的损伤前驱体分布,研究了不同种类的损伤前驱体所引起的损伤形貌。然后根据不同种类的损伤前驱体分别采用表面活性剂、强氧化性酸、氢氟酸的水溶液对不同的损伤前驱体进行处理。研究结果显示:经过前期预先清洗以后,吸收性杂质所导致的雾状损伤得以消除,亚表面分布的裂纹得以很好地平滑钝化,极大地提升了熔石英光学元件的抗损伤性能,损伤阈值从4.8J/cm2提高到11.0J/cm2,最大提升幅度达到原来的2.3倍。
Based on the distribution of damage precursors on the surface and subsurface of the fused silica element caused by polishing, the damage morphologies induced by different kinds of damaged precursors were studied. Then according to different kinds of damage precursors, different damage precursors were treated with surfactant, strong oxidizing acid and hydrofluoric acid respectively. The results show that after pre-cleaning, the damage caused by absorbing impurities can be eliminated and the sub-surface distribution crack can be smooth and passivated, which greatly improves the damage resistance and damage threshold of the fused silica optical element. From 4.8J / cm2 increased to 11.0J / cm2, the maximum increase of 2.3 times the original.