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采用有损耗介质和色散介质的二维时域有限差分方法,数值模拟了以光波长514.5 nm的p偏振基模高斯光束为入射光源,激发Kretschmann型表面等离子体共振,并通过探针的局域场增强效应实现纳米光刻的新方法——探针诱导表面等离子体共振耦合纳米光刻.分别就探针与记录层的间距以及探针针尖大小,模拟分析了不同情况下探针的局域场增强效应和记录层表面的相对电场强度振幅分布.结果表明,探针工作在接触模式时,探针的局域场增强效应最明显,记录层表面的相对电场强度振幅的对比度最大;当探针针尖距记录层5 nm时,针尖下方记录层表面的相对电场强度振幅大于光刻临界值的分布宽度与针尖尺寸相近.
A two-dimensional finite difference time-domain method with lossy media and dispersive media was used to numerically simulate the Krebschmann surface plasmon resonance with a p-polarized fundamental Gaussian beam with an optical wavelength of 514.5 nm as the incident light source. A new method of nano-lithography for field enhancement effect - probe-induced surface plasmon resonance coupled with nano-lithography. The distance between the probe and the recording layer and the size of the probe tip were simulated respectively, and the localization of the probe under different conditions Field enhancement effect and the relative electric field intensity amplitude distribution on the recording layer surface.The results show that the probe has the most obvious local field enhancement effect and the largest contrast of the relative electric field intensity on the recording layer surface when the probe operates in the contact mode, When the needle tip is at a distance of 5 nm from the recording layer, the distribution width of the relative electric field intensity at the recording layer below the tip is larger than the threshold value of the lithography.