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应用绝对反应速度理论和统计力学到化学气相沉积(CVD)钽上,建立了反应速度模型。实验表明,测定值与计算值间吻合较好。证实了用绝对反应速度理论建立的速度模型的正确性,而且证实了化学气相沉积钽的速度控制环节为表面化学反应。
The reaction rate model was established using absolute reaction rate theory and statistical mechanics on chemical vapor deposition (CVD) tantalum. Experiments show that the measured value is in good agreement with the calculated value. The correctness of the velocity model established with the theory of absolute reaction velocity is confirmed, and the speed control of the chemical vapor deposition of tantalum is confirmed as the surface chemical reaction.