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本文采用能量过滤磁控溅射技术(Energy Filter Direct Magnetron Sputtering,EFDMS),通过改变沉积温度在玻璃衬底上制备了一系列TiN薄膜。利用XRD进行了物相鉴定,使用分光光度计、椭圆偏振光谱仪和四探针电阻仪测试了TiN薄膜的光学性能。结果表明:制备的TiN薄膜为多晶态立方结构TiN,且随着衬底温度的升高,薄膜结晶性提高,在近红外区的反射率显著上升,可见光区的透光率有所下降,同时,薄膜的禁带宽度变宽,折射率减小,消光系数升高。
In this paper, a series of TiN thin films were prepared on a glass substrate by changing deposition temperature by using Energy Filter Direct Magnetron Sputtering (EFDMS). The phase characterization was carried out by XRD. The optical properties of TiN films were tested by spectrophotometer, ellipsometer and four-probe resistance tester. The results show that the prepared TiN films are polycrystalline cubic TiN. With the increase of the substrate temperature, the crystallinity of the films increases, the reflectivity in the near infrared region increases significantly, and the light transmittance in the visible region decreases. At the same time, the band gap of the film becomes wider, the refractive index decreases and the extinction coefficient increases.