论文部分内容阅读
采用多靶磁控溅射法制备了一系列具有不同Al2O3调制层厚度的TiN/Al2O3纳米多层膜.利用X射线能量色散谱、X射线衍射、扫描电子显微镜、高分辨透射电子显微镜和微力学探针表征了多层膜的成分、微结构和力学性能.研究结果表明,在TiN/Al2O3纳米多层膜中,单层膜时以非晶态存在的Al2O3层在厚度小于1·5nm时因TiN晶体层的模板效应而晶化,并与TiN层形成共格外延生长,相应地,多层膜产生硬度明显升高的超硬效应,最高硬度可达37·9GPa.进一步增加多层膜中Al2O3调制层的层厚度,Al2O3层逐渐形成非晶结构并破坏了多层膜的共格外延生长,使得多层膜的硬度逐步降低.
A series of TiN / Al2O3 multilayered films with different Al 2 O 3 modulation layer thicknesses were prepared by using multi-target magnetron sputtering method. X-ray energy dispersive spectroscopy, X-ray diffraction, scanning electron microscopy, high resolution transmission electron microscopy and micro-mechanics The results show that in the case of TiN / Al2O3 nano-multilayers, the presence of an amorphous Al2O3 layer in the single-layer film at a thickness of less than 1.5 nm TiN crystal layer and the crystallization of the template and form a coherent epitaxial growth with the TiN layer, correspondingly, the multilayer film has a superhard effect significantly increased hardness, the maximum hardness of up to 37 · 9GPa. Further increase in the multilayer film Al 2 O 3 modulation layer thickness, the Al 2 O 3 layer gradually formed an amorphous structure and undermined the coexistence of multi-layer epitaxial growth, making the multilayer film hardness gradually decreased.