片状氮化硼是制作P—N结的一种渗P型杂质的固体扩散源。我厂在线性电路的制造中试用了片状氮化硼。 目前,与液态扩散源比较,采用片状氮化硼由于扩散后表面方块电阻分布均匀,磷扩散调试方便,因而成品率可有一些提高。而且由于扩散时片子改成竖放,以扩散恒温区300毫 Flake boron nitride is a solid diffusion source for P-type impurities that make P-N junctions. I plant in the manufacture of linear circuits in the trial of flake boron nitride. At present, compared with the liquid diffusion source, the use of flaky boron nitride due to diffusion surface resistance of the box evenly distributed, easy diffusion of phosphorus debugging, so the yield can be somewhat improved. And because the film was changed to vertical placement, to diffuse the constant temperature zone 300 milliliters