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本文采用非平衡磁控溅射沉积技术,以甲烷气体为碳源,99.99%Ti为靶材制备了TiC/DLC多层膜。利用X射线衍射仪、电子显微镜、俄歇电子能谱仪和拉曼光谱仪等对TiC/DLC多层膜的组织、结构、形态及成分进行了分析。结果表明:Ti与C结合生成TiC晶相,过渡层中TiC相呈柱状晶生长,多层膜中的TiC分层以岛状模式生长,DLC分层以层状模式生长,TiC/DLC膜层中含有金刚石成分。TiC/DLC的多层结构受沉积参数的影响,当分层的沉积时间少于1 min时,很难获得清晰的层状结构薄膜,膜中Ti的含量随Ti靶电流的增加而增加;过渡层的引入,提高了膜与基体的结合力,并且过渡层的厚度增加,TiC/DLC膜层同基体之间的结合力增强。
In this paper, non-equilibrium magnetron sputtering deposition technology, methane gas as a carbon source, 99.99% Ti TiC / DLC multilayer target was prepared. The microstructure, structure, morphology and composition of TiC / DLC multilayers were analyzed by X-ray diffraction, electron microscopy, Auger electron spectroscopy and Raman spectroscopy. The results show that the TiC phase is formed by the combination of Ti and C, and the TiC phase grows in columnar crystal in the transitional layer. The TiC layer in the multilayered film grows in island mode, the DLC layer grows in layered mode, and the TiC / DLC layer Contains diamond composition. The multi-layer structure of TiC / DLC is influenced by the deposition parameters. When the deposition time is less than 1 min, it is difficult to obtain a clear layered structure film. The content of Ti in the film increases with the increase of Ti target current. The introduction of the layer improves the bonding force between the film and the substrate, and the thickness of the transition layer increases, and the binding force between the TiC / DLC film and the substrate increases.