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利用射频磁控溅射方法,在光学级单晶金刚石上制备了氧化钒薄膜,然后对其结构与厚度、表面形貌、电学及光学性能进行了表征。实验结果表明,制备出的薄膜表面均匀性良好,为单一组分的V_2O_5薄膜,在(001)面有明显的择优取向,薄膜结晶度和表面形貌非常好;电学性能方面,获得了三组不同厚度V_2O_5薄膜温阻特性曲线,当薄膜为150 nm时,薄膜的电学突变特性最好,电阻值变化幅度将近3个数量级;对不同厚度薄膜的光学响应特性进行了测试分析,当受到高能激光照射时,薄膜均出现了相变和回复,薄膜的光学开关时间均随着膜厚的增加而增加,其中光学关闭时间的变化范围为1.6~2.5 ms,回复时间的变化范围为26~33 ms。
The vanadium oxide film was prepared on the optical grade single crystal diamond by RF magnetron sputtering. The structure and thickness, surface morphology, electrical and optical properties were also characterized. The experimental results show that the prepared films have good surface homogeneity, and are single-component V 2 O 5 thin films with obvious preferred orientation on the (001) plane and very good crystallinity and surface morphology of the films. In terms of electrical properties, three groups When the thickness of the film is 150 nm, the electrical abrupt change of the film is the best, and the change of the resistance value is nearly three orders of magnitude. The optical response characteristics of the films with different thicknesses are tested and analyzed. During the irradiation, the phase transition and recovery of the films appeared. The optical switching time of the films increased with the increase of film thickness. The optical closing time ranged from 1.6 to 2.5 ms and the recovery time ranged from 26 to 33 ms .