本专利介绍了铝的蒸发装置,更确切地说,就是用电子束照射铝使铝蒸发,在蒸发装置的上面装载着蒸发坩埚,其目的是为了提高蒸发速度和得到高纯蒸气。最近,对集成电路的配线和衍射栅的反射镜使用了铝蒸发膜,但是使用过去的蒸发 This patent describes an aluminum evaporation device. More precisely, aluminum is irradiated with an electron beam to evaporate aluminum, and an evaporation crucible is placed on the evaporation device in order to increase the evaporation rate and obtain a high-purity vapor. Recently, an aluminum evaporation film was used for the wiring of the integrated circuit and the mirror of the diffraction grating, but the past evaporation