,Fabrication and characterization of 4H-SiC bipolar junction transistor with double base epilayer

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In this paper we report on a novel structure of a 4H-SiC bipolar junction transistor with a double base epilayer that is continuously grown.The measured dc common-emitter current gain is 16.8 at IC =28.6 mA (JC =183.4 A/cm2),and it increases with the collector current density increasing.The specific on-state resistance (Rsp-on) is 32.3 mΩ.cm2 and the open-base breakdown voltage reaches 410 V.The emitter N-type specific contact resistance and N+ emitter layer sheet resistance are 1.7× 10 3 Ω·cm2 and 150 Ω/□,respectively.
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