评述了光刻、电子蚀刻、X射线蚀刻、离子轰击蚀刻和剥离工艺,并评价了用这些工艺制造声表面波和薄膜光学器件的优缺点。一、引言八年以前,所有声波器件都处于固体棒或固体块的形式。随着叉指式电极表面波换能器的问世 Lithography, electronic etching, X-ray etching, ion bombardment etching and lift-off processes were reviewed, and the advantages and disadvantages of using these processes to manufacture surface acoustic wave and thin-film optics were evaluated. I. INTRODUCTION Eight years ago, all sonic devices were in the form of solid rods or solid blocks. With the advent of interdigital electrode surface wave transducers