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本文介绍非晶硅薄膜太阳能电池生产线的核心设备———等离子体增强化学气相沉积(PECVD,Plasma Enhanced Chemical Vapor Deposition)系统,并阐述了其重要地位。非晶硅太阳能电池制造的关键技术是非晶硅薄膜的制备,目前最常见的制备方法是PECVD技术。PECVD技术凭借其低温沉积、可大面积成膜、成膜均匀等特点,在非晶硅薄膜制备方面迅速发展。PECVD系统用于制备非晶硅太阳能电池的关键结构P、I、N硅薄膜层。本文阐述了该设备的结构特点、技术指标、工作原理及工艺过程,对沉积室的结构和配置进行了详细设计计算,非晶硅太阳能电池稳定后的转化效率可达6%。
This paper introduces the plasma enhanced chemical vapor deposition (PECVD) system, which is the core equipment of the amorphous silicon thin film solar cell production line, and expounds its important position. Amorphous silicon solar cell manufacturing technology is the amorphous silicon thin film preparation, the most common method of preparation is PECVD technology. PECVD technology, with its low temperature deposition, can be a large area of film, uniform film, etc., in the rapid development of amorphous silicon film preparation. PECVD system for the preparation of amorphous silicon solar cells key structure P, I, N silicon film layer. This paper describes the structural features, technical specifications, working principle and process of the device. The structure and configuration of the deposition chamber are designed and calculated in detail. The conversion efficiency of the amorphous silicon solar cell is stable up to 6%.