Preparation of Thin Films by a Bipolar Pulsed-DC Magnetron Sputtering System Using Ca<sub&

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The thin films were deposited on the glass substrates by an asymmetric bipolar pulsed-dc magnetron sputtering system using the Ca3Co4O9 and CaMnO3 Targets (n-type) targets of 60 mm diameter and 2.5 mm thickness. The targets were prepared from powder precu
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