论文部分内容阅读
采用多靶轮流溅射技术，用Ｔｉ和六方氮化硼（ｈ－ＢＮ）反应合成了Ｔｉ－Ｂ－Ｎ薄膜，采用ＸＲＤ、ＴＥＭ和显微硬度计研究了薄膜的微结构及其力学性能。结果表明，室温下沉积的Ｔｉ－Ｂ－Ｎ薄膜为非晶体的Ｔｉ（Ｎ，Ｂ）化合物，其硬度达到ＨＫ２４７０；高温下沉积的薄膜为ＴｉＮ结构类型的Ｔｉ（Ｎ，Ｂ）晶体，薄膜在晶化后硬度略有降低。
The Ti-B-N thin films were synthesized by the multi-target rotation sputtering technique with Ti and hexagonal boron nitride (h-BN). The microstructure and mechanical properties of the films were investigated by XRD, TEM and microhardness tester. The results show that the Ti-B-N thin film deposited at room temperature is an amorphous Ti (N, B) compound with a hardness of HK2470. The TiN thin film deposited at high temperature is Ti (N, B) After the crystallization hardness slightly lower.