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分子束外延技术和设备是半导体研究与生产的一项新的手段。在超高真空环境下,待外延的材料以分子束的形式射向衬底并淀积在衬底上形成外延层。用来产生分子束的分子束源组件是该设备中的一个重要组成部分。它的结构如何设计,影响着整个分子束外延设备中其他部件的配置,对整机的工作性能有着直接的关系。分子束源组件包括若干个喷射炉、快门、准直孔、隔热件、液氮冷阱以及有关的安装结构。这里重点介绍除炉体本身外的各个部分以及整体的组成。呈坩埚状的炉子,按安装方位可分为卧式和立式两种。卧式的并不是完全水平安装,以
Molecular beam epitaxy technology and equipment is a new means of semiconductor research and production. In the ultra-high vacuum environment, the material to be epitaxy is directed into the substrate in the form of a molecular beam and deposited on the substrate to form an epitaxial layer. The molecular beam source module used to generate the molecular beam is an important part of the device. How its structure is designed, affecting the entire molecular beam epitaxy equipment configuration of other components, the performance of the machine has a direct relationship. The molecular beam source assembly includes several injection furnaces, shutters, collimation holes, heat insulators, liquid nitrogen cold traps, and related mounting structures. This section focuses on the various parts of the body except the furnace itself as well as the overall composition. Crucible-shaped furnace, according to the installation orientation can be divided into horizontal and vertical two. Horizontal is not completely horizontal to