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为了探讨Mo元素加入Ni-Cr合金后对提高耐氯离子腐蚀的机理,测定了含Mo合金在盐酸中的阳极极化曲线,点蚀温度,椭圆参数,表面膜的俄歇电子谱(AES)以及X线—光电子谱(XPS或ESCA)。结果表明,在Ni_(60)Cr_(20)中,Mo加入量的增加明显地降低了临介电流密度,增加在氧化性酸中的腐蚀率,而在还原性酸中则相反,表面膜的生长速率与厚度随基体Mo含量的增加而增加,表面膜主要由Cr~(+3)、Mo~(+6)、Ni~(+2)、Cl~-以及两种不同键合方式的氧构成,且膜中的Mo随基体Mo含量的升高稍有增加的趋势,自然膜与1NHCl中形成的钝化膜并不相同。
In order to investigate the mechanism of improving the resistance to chloride ion corrosion after the addition of Mo element to Ni-Cr alloy, the anodic polarization curve, pitting temperature, ellipsometry, Auger electron spectroscopy (AES) And X-ray photoelectron spectroscopy (XPS or ESCA). The results show that the addition of Mo significantly decreases the intervening current density and increases the corrosion rate in oxidizing acid in Ni 60 Cr 20, whereas in reducing acid the opposite is true The growth rate and thickness increase with the increase of Mo content. The surface films mainly consist of Cr ~ (+3), Mo ~ (+6), Ni ~ (+2), Cl ~ , And Mo in the film tends to slightly increase with the increase of the Mo content in the film. The passivation film formed in the natural film and the 1NHCl film are not the same.