The computational methods of deflection fields in magnetic yokes with wedged coil-sections andelectrostatic deflectors with planar electrodes are discussed. The magnetic yokes with wedged coil-sections can be combined into various shapes of magnetic deflectors, which may offer a variety ofchoices for adjusting the deflection field distributions to reduce the deflection aberrations more effec-tively. An advantage of the planar electrostatic deflectors is the simplicity in structure which mightallow the deflectors to be used in the deflection array of multi-electron beam lithography systems.Based on the methods described in this paper two computer programs have been developed. As exam-ples, the deflection field distributions of some typical deflectors have been computed. The computational methods of deflection fields in magnetic yokes with wedged coil-sections andelectrostatic deflectors with planar electrodes are discussed. The magnetic yokes with wedged coil-sections can be combined into various shapes of magnetic deflectors, which may offer a variety of springs for adjusting the deflection field distributions to reduce the deflection aberrations more effec-tively. An advantage of the planar electrostatic deflectors is the simplicity in structure which might allow the deflectors to be used in the deflection array of multi-electron beam lithography systems. Based on the methods described in this paper two computer programs have been developed. As exam-ples, the deflection field distributions of some typical deflectors have been computed.