面阵IRCCD摄像芯片用折射微透镜阵列的离子束刻蚀制作

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采用氩离子束刻蚀制作与一种128×128元PtSiIRCCD摄像芯片匹配的单片硅折射微透镜阵列.所制成的微小光学阵列元件的填充系数高于95%,每单元硅折射微透镜为矩底拱面形,其近轴光(3~5μm光谱波段)的焦距约为80μm,给出了硅折射微透镜阵列的表面探针和扫描电子显微镜测试结果 A single silicon refractive microlens array matched with a 128 × 128 PtSiIRCCD camera was fabricated by argon ion beam etching. The fabricated micro-optical array element has a fill factor of more than 95%. The silicon refractive micro-lens per unit has a bottom-arched shape with a focal length of about 80 μm for paraxial light (3 to 5 μm spectral band), giving the silicon Surface Probes and Scanning Electron Microscopy Test Results for Refractive Microlens Arrays
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